The high‐performance ceramic aluminum nitride has a high resistance to heat and aggressive media. These properties depend to a large degree on the purity of the material. As a result much effort has been invested in the search for new precursors to AlN for use in methods such as metal‐organic chemical vapor deposition (MOCVD). The figure shows pure AlN powder produced from the title compound in an ammonia atmosphere. magnified image
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Rockensüß et al. (1993) studied this question.
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