A very thin ZnO sputtered layer is newly introduced as an intermediate layer to obtain a smooth surface of ZnO film epitaxially grown on a sapphire substrate by the CVD method. By a ZnO–H 2 –H 2 O–O 2 CVD system, a (0001) ZnO film is grown on a (0001) sapphire substrate, while a (11 0) ZnO film is grown on a (1 02) sapphire substrate. The surfaces of as-grown ZnO films are so smooth that a light beam can easily couple and propagate into a waveguide of the ZnO film.
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Ohnishi et al. (1978) studied this question.