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The threshold voltage of an insulated gate field-effect transistor is a function of source-to-substrate reverse bias. In this letter, the previously presented theory is first reviewed. It is then extended to apply to large source-to-substrate reverse bias where the source and drain depletion regions meet under the channel. The result is a pair of theoretical expressions which agree well with experimental measurements.
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Cheney et al. (1968) studied this question.
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