Influence of as-deposited film structure on 〈100〉 texture in laser-recrystallized silicon on fused quartz

A strong 〈100〉 texture has been achieved in cw neodymium:yttrium aluminum garnet laser recrystallization of the 700 °C low pressure chemical vapor deposited (LPCVD) polycrystalline silicon films which exhibit 〈100〉 preferred orientation. When 〈110〉 texture is dominant in as-deposited films, the 〈100〉 texture is not so strong as in the 700 °C LPCVD films. The dependence of the 〈100〉 texture on as-deposited film structure implies that the 〈100〉 grain growth occurs under such a melting condition as the initial film structure is partially maintained.