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October 1, 1989Japanese Journal of Applied Physics

XeCl Excimer Laser Annealing Used to Fabricate Poly-Si TFT's

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Authors

TSToshiyuki SameshimaTokyo Electron (Japan)MHMasaki HaraUniversity of ToyamaSUS. UsuiSony (Taiwan)

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Sameshima et al. (1989) studied this question.

synapsesocial.com/papers/6a853cb83cde6ee03eb2e99dhttps://doi.org/10.1143/jjap.28.1789
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