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November 15, 1984Applied Physics Letters

UV ozone cleaning of silicon substrates in silicon molecular beam epitaxy

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MTMichiharu TabeShizuoka University

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Michiharu Tabe (1984) studied this question.

synapsesocial.com/papers/6a85c0ffc006613b201af28fhttps://doi.org/10.1063/1.95019
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  1. 1A study of nucleation in chemically grown epitaxial silicon films using molecular beam techniques III. Nucleation rate measurements and the effect of oxygen on initial growth behaviour1967 · 134 citations
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  4. 4UV–Ozone Cleaning of GaAs for MBE1982 · 36 citations
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