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March 1, 1982Japanese Journal of Applied Physics

Etching of SiO2 Films by Si in Ultra-High Vacuum

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MTMichiharu TabeShizuoka University

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Michiharu Tabe (1982) studied this question.

synapsesocial.com/papers/6a9019b011fe3daa372b0c05https://doi.org/10.1143/jjap.21.534
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