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May 1, 2006physica status solidi (a)

HighfTandfmaxAlGaN/GaN HFETs achieved by using thin and high‐Al‐composition AlGaN barrier layers and Cat‐CVD SiN passivation

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Authors

MHMasataka HigashiwakiOsaka Prefecture UniversityNONorio OnojimaTakeda (Japan)TMToshiaki MatsuiKyoto University

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Higashiwaki et al. (2006) studied this question.

synapsesocial.com/papers/6a86cac27fdf9298f89eb48ehttps://doi.org/10.1002/pssa.200565199
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