Combinatorial high vacuum chemical vapor deposition (HV-CVD) of mixed thin films has been demonstrated to yield amorphous layers at substrate temperatures where individually deposited pure and films are polycrystalline. Spectroscopic ellipsometry of the films shows that adding to improves the transparency of the films while still maintaining a high refractive index. Atomic force microscopy measurements show that the root-mean-square surface roughness of the films is about 1.2 nm.
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Dabirian et al. (2010) studied this question.