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August 1, 1977Annals of Internal Medicine

Plasma Triglyceride and Insulin Levels in Familial Hypertriglyceridemia

John D. Brunzell

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Structured PICO

P

Population

n+ and p+ doped Si surfaces in silicon solar cell architectures

I

Intervention

SiO2/Al2O3 stacks prepared by atomic layer deposition (ALD) with varying SiO2 interlayer thicknesses (1-14 nm)

C

Comparator

Single layer Al2O3

O

Outcome

Recombination parameter (J0) and fixed charge density (Qf)surrogate

ALD SiO2/Al2O3 stacks provide superior simultaneous passivation of n+ and p+ Si surfaces in solar cells compared to single layer Al2O3.

Implication

ALD SiO2/Al2O3 stacks may enhance n+ Si passivation in lab cells; leaves open translation to commercial solar modules.

Discussion

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Cite This Study

John D. Brunzell (1977) studied this question.

synapsesocial.com/papers/6a86d5b5ed1c9801b3cf85dc https://doi.org/10.7326/0003-4819-87-2-198

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