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December 24, 1990Applied Physics Letters

Maskless laser interferometric monitoring of InP/InGaAsP heterostructure reactive ion etching

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Authors

THTodd R. HayesAT&T (United States)PHPeter HeimannBielefeld UniversityVDV. M. DonnellyAT&T (United States)

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Hayes et al. (1990) studied this question.

synapsesocial.com/papers/6a8705b9a810ea404bcf9e48https://doi.org/10.1063/1.103751
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