Basic deposition process and ferroelectric properties of sputtered PLZT thin films

Sputtering has been widely used for the deposition of perovskite (Pb,La)(Zr,Ti)O3,PLZT, thin films. Sapphire, SrTiO3,and MgO single crystals were used as the substrates for the epitaxial growth. The ideal epitaxial condition for the growth of single crystal thin films is essentially achieved at the stoichiometric chemical composition in the sputtered films, although the sputter deposition has been done under a small excess of the Pb. The excess of the Pb, however, forms secondary phase and affects their microstructure and ferroelectric properties.