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March 1, 1981Journal of Vacuum Science and Technology

Dependence of F atom density on pressure and flow rate in CF4 glow discharges as determined by emission spectroscopy

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JCJ. W. CoburnUniversity of UtahMCM. ChenIBM (United States)

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Coburn et al. (1981) studied this question.

synapsesocial.com/papers/6a87ff4fa082a64c2914b5a4https://doi.org/10.1116/1.570781
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