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November 1, 1979Journal of Applied Physics

The effect of added hydrogen on the rf discharge chemistry of CF4, CF3H, and C2F6

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ETE. A. TRUESDALEUniversity of California, Los AngelesGSG. SmolinskyAT&T (United States)

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TRUESDALE et al. (1979) studied this question.

synapsesocial.com/papers/6a87ff4fa082a64c2914b5a7https://doi.org/10.1063/1.325908
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