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March 1, 1994Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Fluorocarbon high-density plasmas. II. Silicon dioxide and silicon etching using CF4 and CHF3

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Authors

GOG. S. OehrleinUniversity of Maryland, College ParkYZY. ZhangBay Area Environmental Research InstituteDVD. VenderUniversity of Tasmania

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Oehrlein et al. (1994) studied this question.

synapsesocial.com/papers/6a880a463fe66a1452bbf7f4https://doi.org/10.1116/1.578877
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