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A new sessile drop method has been developed for measuring the oxygen dissolution rate from silica glass to silicon melt. Compared to the oxygen dissolution rate obtained using a conventional measurement method, a much larger value has been obtained with the sessile drop method. The experimental accuracy of the sessile drop method was analyzed, and it was found that the main error resulted from the weight change of a blank silica plate following heat treatment. A rectification method was suggested.
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Huang et al. (1998) studied this question.
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