By applying high-rate copper electroplating technique the reliable fabrication of a copper stabilizer on coated conductor with an 1 μm Ag cap is investigated. The obtained mechanical, electrical and encapsulation properties due to a 20 μm thick Cu stabilizer on the surface improve the practical and technical performance. A copper sulphate CuSO4based pulse plating technique is capable to deposit a 20 micrometer thick copper layer in a fast and continuous non-vacuum process. A surround Cu layer protects the HTS conductor surface against salt aqueous solutions, humidity, and against cryogenic liquids LN2and liquid helium. With the copper stabilizer conductor solder joining with a contact resistance of 200 nΩcm2becomes possible. Further effort is being made to develop and construct a high-rate and high throughput continuous reel-to-reel modular plating unit for deposition of long length ( >; 400 m). The paper describes the practical achievements within the conductor fabrication.
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Floegel-Delor et al. (2011) studied this question.
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