We have seen that the challenges with multiport measurements for new digital applications are far from being solved. The evolution of multiport VNA architecture to partial reflectometers means that measurement of coupling between interconnects is cheaper and faster than with full reflectometer systems. However, given the very high connection density in these applications, the error model must still be extended to evaluate leakage between ports.
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Ferrero et al. (2011) studied this question.
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