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July 16, 1990Applied Physics Letters

Sputter deposition of YBa2Cu3O7−x films on Si at 500 °C with conducting metallic oxide as a buffer layer

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QJQ. X. JiaUniversity at Buffalo, State University of New YorkWAWayne A. AndersonFood Safety Authority of Ireland

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Jia et al. (1990) studied this question.

synapsesocial.com/papers/6a887be3e7b4eb5f6b07cd07https://doi.org/10.1063/1.104218
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Also Consider

Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context:

  1. 1Thickness and annealing dependence of the superconducting transition temperature of YBa2Cu3O7−x thin films on oxidized silicon and polycrystalline alumina substrates1988 · 43 citations
  2. 2Epitaxial Y-Ba-Cu-O films on Si with intermediate layer by rf magnetron sputtering1988 · 70 citations
  3. 3As-deposited Y-Ba-Cu-O superconducting films on silicon at 400 °C1989 · 88 citations
  4. 4Sputter Synthesis of Ba2YCu3Oy As-Deposited Superconducting Thin Films from Stoichiometric Target–A Mechanism of Compositional Deviation and Its Control1988 · 88 citations
  5. 5REPRODUCIBLE TECHNIQUE FOR DEPOSITION OF Y–Ba–Cu–O THIN FILM FROM RF SPUTTERING1989 · 5 citations