Amorphous LPCVD silicon oxynitride films of different chemical composition are investigated by ellipsometry and infrared spectroscopy. Models for the interpretation of the experimental results are derived on the basis of bonding statistics, effective medium theory of the dielectric function, and vibrational theory. The parameters of the models are determined from the well known boundary materials of the silicon oxynitride, SiO2 and Si3N4. The aim of the investigations is the derivation of systematic information about structure and physical properties depending on chemical composition of the films.
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U. Teschner (1990) studied this question.
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