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July 1, 1998Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Determination of metal vapor ion concentration in an argon/copper plasma for ionized physical vapor deposition

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Authors

JFJohn E. FosterUniversity of MichiganAWA. WendtUniversité Paris-SudWWW. W. WangUniversity of Wisconsin–Madison

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Foster et al. (1998) studied this question.

synapsesocial.com/papers/6a893263851416c68bf7bc4ehttps://doi.org/10.1116/1.581512
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