Synapse
⌘+K
Synapse
PulseExploreClubsResearchersJournals
Instagram
HomeClubsExplore
January 17, 2003Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Plasma-enhanced chemical vapor deposition of low-kdielectric films using methylsilane, dimethylsilane, and trimethylsilane precursors

View Full Paper
Ask AI
Bookmark
Share

Authors

QWQingguo WuShanghai Public Health Clinical CenterKGKaren K. GleasonIIT@MIT

Discussion

Loading...

Member takes

Implication

Key Points

Key points are not available for this paper at this time.

Cite This Study

Wu et al. (2003) studied this question.

synapsesocial.com/papers/6a89339e1fb56efa37d43750https://doi.org/10.1116/1.1539086
View Full Paper
Ask AI
Bookmark
Share

Also Consider

Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context:

  1. 1Fourier transform infrared spectroscopy of effluents from pulsed plasmas of 1,1,2,2-tetrafluoroethane, hexafluoropropylene oxide, and difluoromethane1999 · 21 citations
  2. 2Low Dielectric Constant Insulator Formed by Downstream Plasma CVD at Room Temperature Using TMS/O21997 · 61 citations
  3. 3Oligomeric Products in Plasma=Polymerized Organosilicones1983 · 73 citations
  4. 4Quantitative correlation of infrared absorption with nuclear magnetic resonance measurements of hydrogen content in diamond films1992 · 59 citations
  5. 5Pyrolytic CVD of poly(organosiloxane) thin films1997 · 18 citations