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May 1, 1998Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Selective inductively coupled plasma etching of group-III nitrides in Cl2- and BCl3-based plasmas

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Authors

RSR. J. ShulSandia National LaboratoriesCWC. G. WillisonUQM Technologies (United States)MBM. M. Bridges

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Shul et al. (1998) studied this question.

synapsesocial.com/papers/6a893bfb186271ac99333436https://doi.org/10.1116/1.581130
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