This paper reports fabrication of high-speed GaAs divider IC's implemented using self-aligned gate (SAG) technology. BFL circuits employing SAG D-MESFET's have operated at higher clock speed (4.0 GHz) and have achieved higher yield (> 80 percent) than circuits with comparable threshold voltage and gate-length fabricated using "selective implant" or "recessed gate" technology.
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Lee et al. (1985) studied this question.
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