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September 1, 1997Journal of The Electrochemical Society

Oxidation of Silicon Using Electron Cyclotron Resonance Nitrous Oxide Plasma and Its Application to Polycrystalline Silicon Thin Film Transistors

Jin‐Woo Lee Nae‐In Lee Sung‐Hoi Hur Chul‐Hi Han

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Abstract

Oxidation of Silicon Using Electron Cyclotron Resonance Nitrous Oxide Plasma and Its Application to Polycrystalline Silicon Thin Film Transistors, Lee, Jin‐Woo, Lee, Nae‐In, Hur, Sung‐Hoi, Han, Chul‐Hi

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Lee et al. (1997) studied this question.

synapsesocial.com/papers/6a895f6f41f4089922bd573a https://doi.org/10.1149/1.1837998

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