Synapse
⌘+K
Synapse
PulseExploreClubsResearchersJournals
Instagram
HomeClubsExplore
March 1, 1978Journal of Vacuum Science and Technology

Profile control by reactive sputter etching

View Full Paper
Ask AI
Bookmark
Share

Authors

HLH. W. LehmannPaul Scherrer InstituteRWRudolf Widmer‐SchnidrigUniversity of Stuttgart

Discussion

Loading...

Member takes

Implication

Key Points

Key points are not available for this paper at this time.

Cite This Study

Lehmann et al. (1978) studied this question.

synapsesocial.com/papers/6a8968fa0f137e402b334429https://doi.org/10.1116/1.569581
View Full Paper
Ask AI
Bookmark
Share