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July 1, 1987Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Relation of polymer structure to plasma etching behavior: Role of atomic fluorine

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Authors

SCStephen R. CainBinghamton UniversityFEFrank D. EgittoEndicott CollegeFEF. EmmiEndicott College

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Cite This Study

Cain et al. (1987) studied this question.

synapsesocial.com/papers/6a897904abe412682d92e723https://doi.org/10.1116/1.574568
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