Fast recovery characteristics can be obtained in Si Ge ∕ Si ∕ Si pin diodes compared to conventional Si pin diodes without any intentional lifetime controls into the i-layers. In the present pin diodes, the tradeoff between the fast recovery and the low forward voltage drop, which is inherent in the conventional pin diodes, can be effectively eliminated. The present diodes allow low power dissipation with fast operation in the switching circuits. The 1D device simulation suggests that the thin SiGe p-layer with a suppressed minority carrier lifetime enhances the diffusion current in the SiGe pin diode, where the stored minority carrier effectively decreases in the Si i-layer.
No takes yet. Share an insight, caveat, or question.
Hirose et al. (2005) studied this question.
Synapse has enriched 5 related papers. Consider them for comparative context: