As a promising lead-free ferroelectric, BiFeO 3 has a very large intrinsic polarization of ∼100 μC/cm 2, enabling its great potential in electronic applications especially in a film format. In this sense, reliable ferroelectric properties are desired; however, pure-phase BiFeO 3 films are notorious for their large leakage current, especially of those processed by using the sol–gel method─a facile and industrially scalable method for film preparation. In this study, a protection layer, which can be easily integrated in the sol–gel process, is used to ensure the acquirement of remnant polarization of ∼65 μC/cm 2 in ∼200 nm BiFeO 3 thin films, whereas O 2 annealing can enhance that to ∼120 μC/cm 2 in ∼400–700 nm films. Reliable ferroelectricity of BiFeO 3 films on Si wafers within a wide thickness range was thus achieved. The obtained ferroelectricity is among the best-achieved properties to date of BiFeO 3 films for both thin and intermediate thicknesses, including both chemically and physically derived. These results are helpful to advance potential use of sol–gel-processed BiFeO 3 films in electromechanical devices with different desired thicknesses.
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Yi et al. (2022) studied this question.
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