Etch products from the reaction on Cl2 with Al(100) and Cu(100) and XeF2 with W(111) and Nb

A modulated-beam, mass spectrometer system has been used to obtain information about etch products, reaction probabilities, and etching mechanisms for the reactions of Cl2 with Al(100) and Cu(100) and for the reaction of XeF2 with W(111) and Nb. The influence of ion bombardment on the etching reaction has also been investigated.