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A review is made of the basic assumptions used in quantitative XPS. Particular attention is paid to problems of electron shake up and shake off, and to the angular distribution of ejected photoelectrons. Following this review, the interaction of XPS with other surface analyses is discussed and illustrated for UPS, ISS, and photon‐induced AES. The paper is concluded with a discussion of the future possible uses and advantages of synchrotron radiation for XPS including the development of XPS for microprobe analysis.
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Thomas A. Carlson (1982) studied this question.
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