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November 3, 1986Applied Physics Letters

Mass spectroscopic identification of wavelength dependent UV laser photoablation fragments from polymethylmethacrylate

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Authors

RER. C. EstlerLos Alamos National LaboratoryNNN. S. NogarUniversity of Nebraska–Lincoln

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Estler et al. (1986) studied this question.

synapsesocial.com/papers/6a8a94181e528df4f2ec7739https://doi.org/10.1063/1.97406
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  1. 1Mechanism of the ultraviolet laser ablation of polymethyl methacrylate at 193 and 248 nm: laser-induced fluorescence analysis, chemical analysis, and doping studies1986 · 169 citations
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  4. 4Surface properties of poly(ethylene terephthalate) films modified by far-ultraviolet radiation at 193nm (laser) and 185nm (low intensity)1986 · 156 citations
  5. 5Photolytic degradation of poly(methyl methacrylate)1963 · 54 citations