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February 1, 1985Japanese Journal of Applied Physics

Recrystallization of Silicon-on-Insulator Structures by Sinusoidally-Scanned Electron Beams

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Authors

HIHiroshi IshiwaraTokyo Institute of TechnologyKOK. OhyuTokyo Institute of TechnologySHSusumu HoritaJapan Advanced Institute of Science and Technology

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Ishiwara et al. (1985) studied this question.

synapsesocial.com/papers/6a8a9512b7bd1b6dd3fb8fbdhttps://doi.org/10.1143/jjap.24.126
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