Relationship between electron sensitivity and chemical structures of polymers as electron beam resist. VII: Electron sensitivity of vinyl polymers containing pendant 1,3‐dioxolan groups

Vinyl polymers containing pendant acetal groups were synthesized using (2,2‐dimethyl‐l,3‐dioxolan‐4‐yl)methyl acrylate (DMA) and (2,2‐dimethyl‐l,3‐dioxo‐lan‐4‐yl)methyl methacrylate (DMM), and were evaluated as negative electron beam (EB) resists. It was found that the EB sensitivity of polymers containing acetal groups in the side chain was higher than that of polymers containing acetal groups in the main chain. A high sensitivity of 3.6 × 10−8 C/cm2 was observed. Copolymers of DMA or DMM with styrene were also synthesized in order to improve the durability for dry etching process. It was found that the copolymers had an excellent dry etching durability and were adaptable to EB lithography.