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January 1, 1975Radiation Effects

Concentration profiles of boron implantations in amorphous and polycrystalline silicon

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WHW. K. HofkerPhilips (United Kingdom)DOD. P. OosthoekPhilips (Netherlands)NKN. J. KoemanVrije Universiteit Amsterdam

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Hofker et al. (1975) studied this question.

synapsesocial.com/papers/6a8ab537e0083a7c2c438ffbhttps://doi.org/10.1080/00337577508240811
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