Highly Stable Ultrathin Carbosiloxane Films by Molecular Layer Deposition

Carbosiloxane thin films are grown by molecular layer deposition (MLD) using 1,2-bis[(dimethylamino)dimethylsilyl]ethane and ozone precursors. The films exhibit a constant growth rate per MLD cycle and saturation behavior in exposure times for both reactants. Fourier-transform infrared spectroscopic study reveals characteristic carbosiloxane vibrational absorptions. The deposition of carbosiloxane films is further confirmed by X-ray photoelectron spectroscopy, and the film composition is shown to be dependent on ozone exposure time. The carbosiloxane films exhibit excellent stability when treated with acid, base, and organic solvent. Thermal stability studies demonstrate that the films are stable to 400 °C, with little thickness loss even at 600 °C, which is comparable to carbosiloxane films deposited by other techniques.