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May 1, 1983IEEE Electron Device Letters

Zone-melting recrystallization of polycrystalline silicon films on fused silica substrates using RF-Heated carbon susceptor

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Authors

YKYutaka KobayashiYamagata UniversityAFAkira FukamiNetherlands Forensic InstituteTSTakaya SuzukiTohoku University

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Kobayashi et al. (1983) studied this question.

synapsesocial.com/papers/6a8b18200ca85c7e33deddb4https://doi.org/10.1109/edl.1983.25677
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