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February 27, 1989Physical Review Letters

Mechanisms of equilibrium and nonequilibrium diffusion of dopants in silicon

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Authors

CNC. S. NicholsArgonne National Laboratory
Chris G. Van de Walle
Chris G. Van de WalleRutgers, The State University of New JerseySPSokrates T. PantelidesNorthwestern University

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Nichols et al. (1989) studied this question.

synapsesocial.com/papers/6a8be0c33fd21775a533c2a6https://doi.org/10.1103/physrevlett.62.1049
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