Effect of ion bombardment during deposition on magnetic film properties

This paper reports on the effect of ion bombardment on the magnetic properties of sputtered cobalt/nickel films. Zero biased films exhibit coercivities in the range of 300 to 1400 oersted (Oe), and hysteresis squareness Mr/Ms values of 0.63 to 0.83, depending on thickness. Similar bias sputtered or ion bombarded films exhibit lower coercive force values. However, films sputtered at a negative 100 V bias contain less oxygen and exhibit a Hcp crystal orientation of (101̄1) as compared to zero bias films which exhibit a (101̄0) orientation. This may account for the reduction in coercive force.