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March 16, 1992Applied Physics Letters

Atomic layer epitaxy of GaN over sapphire using switched metalorganic chemical vapor deposition

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Authors

MKM. Asif KhanRSR. A. SkogmanJHJ. M. Van Hove

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Khan et al. (1992) studied this question.

synapsesocial.com/papers/6a90289ff009383eee840eb2https://doi.org/10.1063/1.107484
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Also Consider

Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context:

  1. 1Novel metalorganic chemical vapor deposition system for GaN growth1991 · 371 citations
  2. 2Properties of Al<i>x</i>Ga1−<i>x</i>N films prepared by reactive molecular beam epitaxy1982 · 274 citations
  3. 3Growth of high optical and electrical quality GaN layers using low-pressure metalorganic chemical vapor deposition1991 · 174 citations
  4. 4High electron mobility GaN/Al<i>x</i>Ga1−<i>x</i>N heterostructures grown by low-pressure metalorganic chemical vapor deposition1991 · 178 citations
  5. 5Stimulated Emission Near Ultraviolet at Room Temperature from a GaN Film Grown on Sapphire by MOVPE Using an AlN Buffer Layer1990 · 200 citations