What question did this study set out to answer?

To evaluate the use of hydrogen peroxide as an oxidant for sequential surface-chemical-reaction-limited synthesis of high-quality aluminum oxide thin films at low temperatures.

June 1, 1991Japanese Journal of Applied PhysicsOpen Access

Low-Temperature Growth of Thin Films of Al2O3 by Sequential Surface Chemical Reaction of trimethylaluminum and H2O2

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To evaluate the use of hydrogen peroxide as an oxidant for sequential surface-chemical-reaction-limited synthesis of high-quality aluminum oxide thin films at low temperatures.
Implemented a sequential surface-chemical-reaction-limited growth process using alternating exposures of trimethylaluminum and hydrogen peroxide vapor.
Assessed surface reactivity, film uniformity, and growth characteristics across temperatures down to room temperature.
Trimethylaluminum reacted readily with hydrogen peroxide at temperatures as low as room temperature.
The synthesized aluminum oxide films demonstrated identical, conformal growth across all exposed surfaces.
The deposited films exhibited high electrical insulation and ideal structural uniformity.

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Implication

Experimental study demonstrates room-temperature growth of uniform aluminum oxide thin films using hydrogen peroxide, indicating a viable method for coating temperature-sensitive substrates.

Cite This Study

Fan et al. (1991) studied this question.

synapsesocial.com/papers/6a902ac473c1f5e62dc91d1e https://doi.org/10.1143/jjap.30.l1139

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Implication

Experimental study demonstrates room-temperature growth of uniform aluminum oxide thin films using hydrogen peroxide, indicating a viable method for coating temperature-sensitive substrates.

Low-Temperature Growth of Thin Films of Al2O3 by Sequential Surface Chemical Reaction of trimethylaluminum and H2O2

Key Points

Discussion

Implication

Cite This Study

Low-Temperature Growth of Thin Films of Al2O3 by Sequential Surface Chemical Reaction of trimethylaluminum and H2O2

Key Points

Discussion

Implication

Cite This Study

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