Magnetron sputter epitaxy of wurtzite Al1−xInxN(0.1<x<0.9) by dual reactive dc magnetron sputter deposition

Ternary wurtzite Al1−xInxN thin films with compositions throughout the miscibility gap have been grown onto seed layers of TiN and ZrN by magnetron sputter epitaxy (MSE) using dual reactive direct current magnetron sputter deposition under ultra high vacuum conditions. The film compositions were calculated using Vegard’s law from lattice parameters determined by x-ray diffraction (XRD). XRD showed that single-phase Al1−xInxN alloy films in the wurtzite structure with [0.10