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May 1, 1992Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

Properties of silicon dioxide films deposited at low temperatures by microwave plasma enhanced decomposition of tetraethylorthosilicate

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Authors

SRS. K. RayUniversity of CalcuttaCMC. K. MaitiNational Institute of Pharmaceutical Education and ResearchSLS. K. LahiriUniversity of Calcutta

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Ray et al. (1992) studied this question.

synapsesocial.com/papers/6a90dcbd647f40dea9c1a36ahttps://doi.org/10.1116/1.586090
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