A nanosieve with a very uniform pore size of 260 nm and a pore-to-pore spacing of 510 nm has been fabricated using multiple exposure interference lithography and (silicon) micromachining technology. The nanosieve filter consists of a thick silicon nitride membrane perforated with submicron diameter pores and a macroperforated inorganic silicon support. The calculated clean water flux is at least one to two orders higher than that of conventional inorganic membranes.
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Rijn et al. (1998) studied this question.
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