By flowing gases through arrays of microhollow cathode holes, large area (12 mm in diameter) uniform and stable discharges could be generated by a rf power supply. Both the rf power and the gas flow through the cathode holes played key roles in maintaining uniform and stable discharges. The discharges could be stable for a period longer than one hour in pure helium (He) and in He containing 1% hexamethyldisiloxane (HMDSO). By using a third steel electrode biased with a pulse power supply (100 kHz, 50% duty cycle), the plasma from arrays of cathode holes could be extended to 20 mm in length. Amorphous carbon films deposited by the extended atmospheric plasma using 1% HMDSO/He reactants exhibited the same structure as those by low pressure plasma chemical vapor deposition.
No takes yet. Share an insight, caveat, or question.
Guo et al. (2003) studied this question.
Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context: