A series of Nb–Ti–N films have been prepared, with various Nb/Ti ratios, by a high purity, reactive sputtering process. A maximum in transition temperature (at ∼ 15.5°K) has been obtained for a composition of Nb0.5Ti0.5N. Critical field and critical current measurements indicate a degradation in these properties with increasing titanium content, contrary to results reported previously.
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Gavaler et al. (1969) studied this question.
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