Normal-incidence Ge quantum-dot photodetectors at 1.5 μm based on Si substrate

Coherent Ge quantum dots embedded in Si spacing layers were grown on Si substrate by molecular-beam epitaxy in the Stranski–Krastanov mode. Photoluminescence measurement showed a Ge-dot-related peak at 1.46 μm. p-i-n photodiodes with the intrinsic layer containing Ge dots were fabricated, and current–voltage (I–V) measurement showed a low dark current density of 3×10−5 A/cm2 at −1 V. A strong photoresponse at 1.3–1.52 μm originating from Ge dots was observed, and at normal incidence, an external quantum efficiency of 8% was achieved at −2.5 V.