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January 1, 1969Proceedings of the IEEE

Shallow phosphorus diffusion profiles in silicon

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JTJ. C. C. TsaiAT&T (United States)

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J. C. C. Tsai (1969) studied this question.

synapsesocial.com/papers/6a914b3f9ea92d4f71f07571https://doi.org/10.1109/proc.1969.7325
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Also Consider

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  1. 1Formation and Composition of Surface Layers and Solubility Limits of Phosphorus During Diffusion in Silicon1964 · 87 citations
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