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August 1, 1995Journal of Applied Physics

High-resolution determination of the stress in individual interconnect lines and the variation due to electromigration

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Authors

QMQing MaValve (United States)SCS. ChirasDCDavid R. ClarkeUniversity of Pisa

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Ma et al. (1995) studied this question.

synapsesocial.com/papers/6a918d12e20e8bd0e5f13054https://doi.org/10.1063/1.360255
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