Engineering a Unified Dielectric Solution for AlGaN/GaN MOS-HFET Gate and Access Regions

Typically GaN metal-oxide-semiconductor heterojunction-field-effect transistors (MOS-HFETs) have used two separate dielectrics for the gate and access regions. However, as this article shows, with proper gate-stack engineering, a unified dielectric solution can be achieved for the transistor. HfO2dielectrics were deposited by atomic layer deposition (ALD). Two types of oxidants were investigated, namely, water (H2O) and ozone (O3). It was found that MOS-HFETs with O3oxidant yielded lower threshold voltage (VTH) shifts, higher maximum drain current (IDS,max) of 340 mA/mm, 20% lower ON-resistance (RON), higher peak transconductance at 112.66 mS/mm, lower hysteresis, and lower gate leakage (5.4 × 10-6A/cm2) compared to water oxidant based MOS-HFETs with IDS,max of 240 mA/mm, 81.38 mS/mm peak transconductance, and 1.7 × 10-4A/cm2gate leakage. DC/RF dispersion tests showed MOS-HFETs with O3oxidant had -200x better current collapse recovery. Temperature characterization and reliability test results, such as high-temperature reverse bias (HTRB), are published for the first time on ALD-HfO2/AlGaN/GaN MOSHFETs using tetrakis(dimethylamino)hafnium (TDMAH) and O3precursor. Using an ozone oxidant provided more stability (i.e., less variability in RON and VTH) as a function of temperature. Finally, when devices were electrically stressed in the OFF-state, the HTRB test showed minimal VTH drift (3oxidant versus much larger VTH drift (2.5 V) in the case of H2O oxidant.